uni805A-TW (聚): contour overlapping and design issue

[tamcy]

First, there is a minor overlapping issue in the ExtraLight master. Just a few pixels away so probably unnoticeable unless in a very large print:

Perhaps a more important issue is the positioning of the upper component "取". The component had been shifted about 20 units higher in both masters when compared with other variants. This is probably inadvertent, at least for the ExtraLight master, as the result is not very satisfying:

(Left: uni805A-TW, right: >uni805A-JP)

For the Heavy master, excuse my ignorance, but I can't decide which is better. The TW glyph still looks a bit too high, but the JP glyph looks a bit low to me?

So this issue is mainly about the ExtraLight master. Please see if the Heavy master also need to be tweaked.

[tamcy]

In case a redesign is accepted you may use this as a reference: uni805A.zip

The reference glyph is composed with the upper part of uni805A-JP and the lower part of uni81EE-CN with some adjustments. Thanks!